Memory device having multiple dielectric gate stacks and related methods

A memory device may include a semiconductor substrate, and a memory transistor in the semiconductor substrate. The memory transistor may include source and drain regions in the semiconductor substrate and a channel region therebetween, and a gate stack. The gate stack may include a first dielectric...

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Bibliographische Detailangaben
Hauptverfasser: LIU QING, EDGE LISA, KHARE PRASANNA, ALLEGRET-MARET STEPHANE, LOUBET NICOLAS, CHENG KANGGUO, JAGANNATHAN HEMANTH, DORIS BRUCE
Format: Patent
Sprache:eng
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