Plasma processing method and plasma processing apparatus

A plasma processing method is used to etch a multilayered material having a stacked structure, in which a first magnetic layer, an insulating layer, a second magnetic layer, and a mask material are stacked in sequence, in a plasma processing apparatus including a processing chamber that partitions a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NISHIMURA EIICHI, KOTSUGI TADASHI, SONE TAKASHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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