Methods of forming oxides, methods of forming semiconductor constructions, and methods of forming isolation regions

Some embodiments include methods of forming isolation regions in which spin-on material (for example, polysilazane) is converted to a silicon dioxide-containing composition. The conversion may utilize one or more oxygen-containing species (such as ozone) and a temperature of less than or equal to 30...

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Bibliographische Detailangaben
Hauptverfasser: HANSON ROBERT J, FUCSKO JANOS
Format: Patent
Sprache:eng
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