Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow

Methods and systems for controlling temperatures in plasma processing chamber via pulsed application of heating power and pulsed application of cooling power. In an embodiment, temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the pr...

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Hauptverfasser: MERRY WALTER R, ZHOU XIAOPING, MAHADESWARASWAMY CHETAN, SILVEIRA FERNANDO M, MAYS BRAD L, PATTAR YASHASWINI B, TSONG TINA, NEVIL SHANE C, TAVASSOLI HAMID, BUCHBERGER DOUGLAS A, NGUYEN DUY D
Format: Patent
Sprache:eng
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