Semiconductor structure

A method of forming a semiconductor structure is provided. A substrate having a cell area and a periphery area is provided. A stacked structure including a gate oxide layer, a floating gate and a first spacer is formed on the substrate in the cell area and a resistor is formed on the substrate in th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LAI TUNG-MING, HSU CHENIU, HSUEH KAI-AN, HUANG MING-DE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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