Peeling apparatus and manufacturing apparatus of semiconductor device

To eliminate electric discharge when an element formation layer including a semiconductor element is peeled from a substrate used for manufacturing the semiconductor element, a substrate over which an element formation layer and a peeling layer are formed and a film are made to go through a gap betw...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TANI ATSUHIRO, HASHIMOTO KENICHI, HOSAKA YASUHARU, MONMA YOHEI, HIROSUE MISAKO, EGUCHI SHINGO
Format: Patent
Sprache:eng
Schlagworte:
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