Metrology systems and methods

Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffract...

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Bibliographische Detailangaben
Hauptverfasser: MANASSEN AMNON, LEVINSKI VLADIMIR, CHUANG YUNG-HO ALEX, NEGRI DARIA, SELIGSON JOEL, HILL ANDREW, SELA ILAN, KANDEL DANIEL, BACHAR OHAD, MARKOWITZ MOSHE, SVIZHER ALEXANDER, ROTEM EFRAIM
Format: Patent
Sprache:eng
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Zusammenfassung:Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.