Lithographic apparatus having an encoder type position sensor system

A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the...

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Bibliographische Detailangaben
Hauptverfasser: LOOPSTRA ERIK ROELOF, EUSSEN EMIEL JOZEF, VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS, BEERENS RUUD ANTONIUS CATHARINA MARIA, BOX WILHELMUS JOSEPHUS, SMITS ALBERTUS ADRIANUS, STEIJAERT PETER PAUL
Format: Patent
Sprache:eng
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