Multi-layered chemical-mechanical planarization pad
The present disclosure relates to a chemical mechanical planarization pad and a method of making and using a chemical mechanical planarization pad. The chemical mechanical planarization pad may include a first component including a water soluble composition and water insoluble composition exhibiting...
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| creator | MATHEW ANOOP QIAO SCOTT XIN HSU OSCAR K LEFEVRE PAUL WELLS DAVID ADAM WU GUANGWEI JIN MARC C ALDEBORGH JOHN ERIK |
| description | The present disclosure relates to a chemical mechanical planarization pad and a method of making and using a chemical mechanical planarization pad. The chemical mechanical planarization pad may include a first component including a water soluble composition and water insoluble composition exhibiting a solubility in water of less than that of the water soluble composition, wherein at least one of the water soluble and water insoluble compositions of the first component is formed of fibers. The chemical mechanical planarization pad may also include a second component, wherein the first component is present as a discrete phase in a continuous of the second component. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8790165B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8790165B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8790165B23</originalsourceid><addsrcrecordid>eNrjZDD2Lc0pydTNSaxMLUpNUUjOSM3NTE7M0c1NTc5IzAMxFQpyEvMSizKrEksy8_MUChJTeBhY0xJzilN5oTQ3g4Kba4izh25qQX58anFBYnJqXmpJfGiwhbmlgaGZqZORMRFKAM0mLIs</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Multi-layered chemical-mechanical planarization pad</title><source>esp@cenet</source><creator>MATHEW ANOOP ; QIAO SCOTT XIN ; HSU OSCAR K ; LEFEVRE PAUL ; WELLS DAVID ADAM ; WU GUANGWEI ; JIN MARC C ; ALDEBORGH JOHN ERIK</creator><creatorcontrib>MATHEW ANOOP ; QIAO SCOTT XIN ; HSU OSCAR K ; LEFEVRE PAUL ; WELLS DAVID ADAM ; WU GUANGWEI ; JIN MARC C ; ALDEBORGH JOHN ERIK</creatorcontrib><description>The present disclosure relates to a chemical mechanical planarization pad and a method of making and using a chemical mechanical planarization pad. The chemical mechanical planarization pad may include a first component including a water soluble composition and water insoluble composition exhibiting a solubility in water of less than that of the water soluble composition, wherein at least one of the water soluble and water insoluble compositions of the first component is formed of fibers. The chemical mechanical planarization pad may also include a second component, wherein the first component is present as a discrete phase in a continuous of the second component.</description><language>eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TOOLS FOR GRINDING, BUFFING, OR SHARPENING ; TRANSPORTING</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140729&DB=EPODOC&CC=US&NR=8790165B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140729&DB=EPODOC&CC=US&NR=8790165B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MATHEW ANOOP</creatorcontrib><creatorcontrib>QIAO SCOTT XIN</creatorcontrib><creatorcontrib>HSU OSCAR K</creatorcontrib><creatorcontrib>LEFEVRE PAUL</creatorcontrib><creatorcontrib>WELLS DAVID ADAM</creatorcontrib><creatorcontrib>WU GUANGWEI</creatorcontrib><creatorcontrib>JIN MARC C</creatorcontrib><creatorcontrib>ALDEBORGH JOHN ERIK</creatorcontrib><title>Multi-layered chemical-mechanical planarization pad</title><description>The present disclosure relates to a chemical mechanical planarization pad and a method of making and using a chemical mechanical planarization pad. The chemical mechanical planarization pad may include a first component including a water soluble composition and water insoluble composition exhibiting a solubility in water of less than that of the water soluble composition, wherein at least one of the water soluble and water insoluble compositions of the first component is formed of fibers. The chemical mechanical planarization pad may also include a second component, wherein the first component is present as a discrete phase in a continuous of the second component.</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TOOLS FOR GRINDING, BUFFING, OR SHARPENING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD2Lc0pydTNSaxMLUpNUUjOSM3NTE7M0c1NTc5IzAMxFQpyEvMSizKrEksy8_MUChJTeBhY0xJzilN5oTQ3g4Kba4izh25qQX58anFBYnJqXmpJfGiwhbmlgaGZqZORMRFKAM0mLIs</recordid><startdate>20140729</startdate><enddate>20140729</enddate><creator>MATHEW ANOOP</creator><creator>QIAO SCOTT XIN</creator><creator>HSU OSCAR K</creator><creator>LEFEVRE PAUL</creator><creator>WELLS DAVID ADAM</creator><creator>WU GUANGWEI</creator><creator>JIN MARC C</creator><creator>ALDEBORGH JOHN ERIK</creator><scope>EVB</scope></search><sort><creationdate>20140729</creationdate><title>Multi-layered chemical-mechanical planarization pad</title><author>MATHEW ANOOP ; QIAO SCOTT XIN ; HSU OSCAR K ; LEFEVRE PAUL ; WELLS DAVID ADAM ; WU GUANGWEI ; JIN MARC C ; ALDEBORGH JOHN ERIK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8790165B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TOOLS FOR GRINDING, BUFFING, OR SHARPENING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MATHEW ANOOP</creatorcontrib><creatorcontrib>QIAO SCOTT XIN</creatorcontrib><creatorcontrib>HSU OSCAR K</creatorcontrib><creatorcontrib>LEFEVRE PAUL</creatorcontrib><creatorcontrib>WELLS DAVID ADAM</creatorcontrib><creatorcontrib>WU GUANGWEI</creatorcontrib><creatorcontrib>JIN MARC C</creatorcontrib><creatorcontrib>ALDEBORGH JOHN ERIK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MATHEW ANOOP</au><au>QIAO SCOTT XIN</au><au>HSU OSCAR K</au><au>LEFEVRE PAUL</au><au>WELLS DAVID ADAM</au><au>WU GUANGWEI</au><au>JIN MARC C</au><au>ALDEBORGH JOHN ERIK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Multi-layered chemical-mechanical planarization pad</title><date>2014-07-29</date><risdate>2014</risdate><abstract>The present disclosure relates to a chemical mechanical planarization pad and a method of making and using a chemical mechanical planarization pad. The chemical mechanical planarization pad may include a first component including a water soluble composition and water insoluble composition exhibiting a solubility in water of less than that of the water soluble composition, wherein at least one of the water soluble and water insoluble compositions of the first component is formed of fibers. The chemical mechanical planarization pad may also include a second component, wherein the first component is present as a discrete phase in a continuous of the second component.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING |
| title | Multi-layered chemical-mechanical planarization pad |
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