Apparatus and method for recovering liquid droplets in immersion lithography
Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is dete...
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| creator | KESWANI GAURAV POON ALEX KA TIM KHO LEONARD WAI FUNG |
| description | Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8780323B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8780323B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8780323B23</originalsourceid><addsrcrecordid>eNqNizEOwjAMALswIOAP_gASaga6AgIxsAFzZTVuaymJjZMi8Xs68ACmG-5uWd0OqmhYpgyYPEQqo3joxcCokzcZpwECvyb24E00UMnACThGssySZjkvg6GOn3W16DFk2vy4quByfpyuW1JpKSt2lKi0z3uzb3audsfa_ZF8AYDPNk0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus and method for recovering liquid droplets in immersion lithography</title><source>esp@cenet</source><creator>KESWANI GAURAV ; POON ALEX KA TIM ; KHO LEONARD WAI FUNG</creator><creatorcontrib>KESWANI GAURAV ; POON ALEX KA TIM ; KHO LEONARD WAI FUNG</creatorcontrib><description>Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140715&DB=EPODOC&CC=US&NR=8780323B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140715&DB=EPODOC&CC=US&NR=8780323B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KESWANI GAURAV</creatorcontrib><creatorcontrib>POON ALEX KA TIM</creatorcontrib><creatorcontrib>KHO LEONARD WAI FUNG</creatorcontrib><title>Apparatus and method for recovering liquid droplets in immersion lithography</title><description>Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNizEOwjAMALswIOAP_gASaga6AgIxsAFzZTVuaymJjZMi8Xs68ACmG-5uWd0OqmhYpgyYPEQqo3joxcCokzcZpwECvyb24E00UMnACThGssySZjkvg6GOn3W16DFk2vy4quByfpyuW1JpKSt2lKi0z3uzb3audsfa_ZF8AYDPNk0</recordid><startdate>20140715</startdate><enddate>20140715</enddate><creator>KESWANI GAURAV</creator><creator>POON ALEX KA TIM</creator><creator>KHO LEONARD WAI FUNG</creator><scope>EVB</scope></search><sort><creationdate>20140715</creationdate><title>Apparatus and method for recovering liquid droplets in immersion lithography</title><author>KESWANI GAURAV ; POON ALEX KA TIM ; KHO LEONARD WAI FUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8780323B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>KESWANI GAURAV</creatorcontrib><creatorcontrib>POON ALEX KA TIM</creatorcontrib><creatorcontrib>KHO LEONARD WAI FUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KESWANI GAURAV</au><au>POON ALEX KA TIM</au><au>KHO LEONARD WAI FUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus and method for recovering liquid droplets in immersion lithography</title><date>2014-07-15</date><risdate>2014</risdate><abstract>Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Apparatus and method for recovering liquid droplets in immersion lithography |
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