Water supply apparatus
A water supply apparatus is capable of performing a backup operation, without lowering water supply capability, when a failure has occurred in one control substrate due to surge or noise caused by lightning or sensor wear, by switching to the other control substrate, and capable of reliably performi...
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creator | MIYAUCHI SACHIKO KOMATSU TAKAHIDE HIGAKI NOBUHIRO TEJIMA TOMOHARU KANEDA KAZUHIRO |
description | A water supply apparatus is capable of performing a backup operation, without lowering water supply capability, when a failure has occurred in one control substrate due to surge or noise caused by lightning or sensor wear, by switching to the other control substrate, and capable of reliably performing the backup operation. The water supply apparatus includes: a plurality of pumps; a plurality of inverters each configured to change and control a rotational frequency of a corresponding one of the plurality of pumps; and a plurality of control substrates configured to control the plurality of inverters. When an abnormality occurs in one control substrate, other control substrate backs up the one control substrate to thereby allow the water supply apparatus to continue its operations. The one control substrate, the plurality of inverters, and the other control substrate are connected in series by communication lines. |
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The water supply apparatus includes: a plurality of pumps; a plurality of inverters each configured to change and control a rotational frequency of a corresponding one of the plurality of pumps; and a plurality of control substrates configured to control the plurality of inverters. When an abnormality occurs in one control substrate, other control substrate backs up the one control substrate to thereby allow the water supply apparatus to continue its operations. The one control substrate, the plurality of inverters, and the other control substrate are connected in series by communication lines.</description><language>eng</language><subject>BLASTING ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; NON-POSITIVE DISPLACEMENT PUMPS ; POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS ; PUMPS ; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS ; WEAPONS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140506&DB=EPODOC&CC=US&NR=8714933B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140506&DB=EPODOC&CC=US&NR=8714933B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAUCHI SACHIKO</creatorcontrib><creatorcontrib>KOMATSU TAKAHIDE</creatorcontrib><creatorcontrib>HIGAKI NOBUHIRO</creatorcontrib><creatorcontrib>TEJIMA TOMOHARU</creatorcontrib><creatorcontrib>KANEDA KAZUHIRO</creatorcontrib><title>Water supply apparatus</title><description>A water supply apparatus is capable of performing a backup operation, without lowering water supply capability, when a failure has occurred in one control substrate due to surge or noise caused by lightning or sensor wear, by switching to the other control substrate, and capable of reliably performing the backup operation. The water supply apparatus includes: a plurality of pumps; a plurality of inverters each configured to change and control a rotational frequency of a corresponding one of the plurality of pumps; and a plurality of control substrates configured to control the plurality of inverters. When an abnormality occurs in one control substrate, other control substrate backs up the one control substrate to thereby allow the water supply apparatus to continue its operations. The one control substrate, the plurality of inverters, and the other control substrate are connected in series by communication lines.</description><subject>BLASTING</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>NON-POSITIVE DISPLACEMENT PUMPS</subject><subject>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</subject><subject>PUMPS</subject><subject>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBALTyxJLVIoLi0oyKlUSCwoSCxKLCkt5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8aHBFuaGJpbGxk5GxkQoAQB8tyGW</recordid><startdate>20140506</startdate><enddate>20140506</enddate><creator>MIYAUCHI SACHIKO</creator><creator>KOMATSU TAKAHIDE</creator><creator>HIGAKI NOBUHIRO</creator><creator>TEJIMA TOMOHARU</creator><creator>KANEDA KAZUHIRO</creator><scope>EVB</scope></search><sort><creationdate>20140506</creationdate><title>Water supply apparatus</title><author>MIYAUCHI SACHIKO ; KOMATSU TAKAHIDE ; HIGAKI NOBUHIRO ; TEJIMA TOMOHARU ; KANEDA KAZUHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8714933B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>BLASTING</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>NON-POSITIVE DISPLACEMENT PUMPS</topic><topic>POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS</topic><topic>PUMPS</topic><topic>PUMPS FOR LIQUIDS OR ELASTIC FLUIDS</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAUCHI SACHIKO</creatorcontrib><creatorcontrib>KOMATSU TAKAHIDE</creatorcontrib><creatorcontrib>HIGAKI NOBUHIRO</creatorcontrib><creatorcontrib>TEJIMA TOMOHARU</creatorcontrib><creatorcontrib>KANEDA KAZUHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAUCHI SACHIKO</au><au>KOMATSU TAKAHIDE</au><au>HIGAKI NOBUHIRO</au><au>TEJIMA TOMOHARU</au><au>KANEDA KAZUHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Water supply apparatus</title><date>2014-05-06</date><risdate>2014</risdate><abstract>A water supply apparatus is capable of performing a backup operation, without lowering water supply capability, when a failure has occurred in one control substrate due to surge or noise caused by lightning or sensor wear, by switching to the other control substrate, and capable of reliably performing the backup operation. The water supply apparatus includes: a plurality of pumps; a plurality of inverters each configured to change and control a rotational frequency of a corresponding one of the plurality of pumps; and a plurality of control substrates configured to control the plurality of inverters. When an abnormality occurs in one control substrate, other control substrate backs up the one control substrate to thereby allow the water supply apparatus to continue its operations. The one control substrate, the plurality of inverters, and the other control substrate are connected in series by communication lines.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BLASTING HEATING LIGHTING MECHANICAL ENGINEERING NON-POSITIVE DISPLACEMENT PUMPS POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS WEAPONS |
title | Water supply apparatus |
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