Lithographic apparatus configured to suppress contamination from passing into the projection system and method
A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall o...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | NIENHUYS HAN-KWANG JONKERS PETER GERARDUS HUIJBERTS ALEXANDER MARINUS ARNOLDUS |
| description | A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8625068B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8625068B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8625068B23</originalsourceid><addsrcrecordid>eNqNzUEKwkAMheFuXIh6h1xAkIqla0Vx4U5dlzBN2xEnCZN04e0txQO4evDzwVsWfIs-SJ9RhxgAVTGjjwZBuIv9mKkFF7BRNZPN2TFFRo_C0GVJoGgWuYfIE_SBQLO8KMzAPuaUALmFRNNPuy4WHb6NNr9dFXA5P07XLak0ZIqBmLx53uuqPOyq-lju_yBfDS1DuA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus configured to suppress contamination from passing into the projection system and method</title><source>esp@cenet</source><creator>NIENHUYS HAN-KWANG ; JONKERS PETER GERARDUS ; HUIJBERTS ALEXANDER MARINUS ARNOLDUS</creator><creatorcontrib>NIENHUYS HAN-KWANG ; JONKERS PETER GERARDUS ; HUIJBERTS ALEXANDER MARINUS ARNOLDUS</creatorcontrib><description>A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140107&DB=EPODOC&CC=US&NR=8625068B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140107&DB=EPODOC&CC=US&NR=8625068B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NIENHUYS HAN-KWANG</creatorcontrib><creatorcontrib>JONKERS PETER GERARDUS</creatorcontrib><creatorcontrib>HUIJBERTS ALEXANDER MARINUS ARNOLDUS</creatorcontrib><title>Lithographic apparatus configured to suppress contamination from passing into the projection system and method</title><description>A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzUEKwkAMheFuXIh6h1xAkIqla0Vx4U5dlzBN2xEnCZN04e0txQO4evDzwVsWfIs-SJ9RhxgAVTGjjwZBuIv9mKkFF7BRNZPN2TFFRo_C0GVJoGgWuYfIE_SBQLO8KMzAPuaUALmFRNNPuy4WHb6NNr9dFXA5P07XLak0ZIqBmLx53uuqPOyq-lju_yBfDS1DuA</recordid><startdate>20140107</startdate><enddate>20140107</enddate><creator>NIENHUYS HAN-KWANG</creator><creator>JONKERS PETER GERARDUS</creator><creator>HUIJBERTS ALEXANDER MARINUS ARNOLDUS</creator><scope>EVB</scope></search><sort><creationdate>20140107</creationdate><title>Lithographic apparatus configured to suppress contamination from passing into the projection system and method</title><author>NIENHUYS HAN-KWANG ; JONKERS PETER GERARDUS ; HUIJBERTS ALEXANDER MARINUS ARNOLDUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8625068B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>NIENHUYS HAN-KWANG</creatorcontrib><creatorcontrib>JONKERS PETER GERARDUS</creatorcontrib><creatorcontrib>HUIJBERTS ALEXANDER MARINUS ARNOLDUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NIENHUYS HAN-KWANG</au><au>JONKERS PETER GERARDUS</au><au>HUIJBERTS ALEXANDER MARINUS ARNOLDUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus configured to suppress contamination from passing into the projection system and method</title><date>2014-01-07</date><risdate>2014</risdate><abstract>A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US8625068B2 |
| source | esp@cenet |
| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus configured to suppress contamination from passing into the projection system and method |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T12%3A56%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NIENHUYS%20HAN-KWANG&rft.date=2014-01-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8625068B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |