Substrate processing apparatus with composite seal
A seal for sealing an interface between a container and a lid of a process chamber. The seal comprises a first seal element and a second seal element that are arranged to seal the interface in series, with the second seal element being situated to encounter processing activity upstream of the fist s...
Gespeichert in:
Hauptverfasser: | , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | COPPOLA STEPHEN NAVARRO JEFF BOWMAN DON CORNETT KENNETH W SCHENK DOUGLAS C KAMIBAYASHIYAMA JULIAN FUNKE DAN PAYNE JEREMY M PETERSON DONALD J |
description | A seal for sealing an interface between a container and a lid of a process chamber. The seal comprises a first seal element and a second seal element that are arranged to seal the interface in series, with the second seal element being situated to encounter processing activity upstream of the fist seal element. The first seal element has a deflectable portion and a protrusion extending radially from the deflectable portion. The second seal element has a radially extending recess in which the protrusion of the first seal element is received. The protrusion and recess interlock to restrict separation and/or rotation of the first and second seal elements. Inclined surfaces of the first seal element interact with the second seal element to apply axial sealing forces to sealing surfaces of the second seal member. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8623145B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8623145B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8623145B23</originalsourceid><addsrcrecordid>eNrjZDAKLk0qLilKLElVKCjKT04tLs7MS1dILChIBIqVFiuUZ5ZkKCTn5xbkF2cC1RSnJubwMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JL40GALMyNjQxNTJyNjIpQAAMquLIQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Substrate processing apparatus with composite seal</title><source>esp@cenet</source><creator>COPPOLA STEPHEN ; NAVARRO JEFF ; BOWMAN DON ; CORNETT KENNETH W ; SCHENK DOUGLAS C ; KAMIBAYASHIYAMA JULIAN ; FUNKE DAN ; PAYNE JEREMY M ; PETERSON DONALD J</creator><creatorcontrib>COPPOLA STEPHEN ; NAVARRO JEFF ; BOWMAN DON ; CORNETT KENNETH W ; SCHENK DOUGLAS C ; KAMIBAYASHIYAMA JULIAN ; FUNKE DAN ; PAYNE JEREMY M ; PETERSON DONALD J</creatorcontrib><description>A seal for sealing an interface between a container and a lid of a process chamber. The seal comprises a first seal element and a second seal element that are arranged to seal the interface in series, with the second seal element being situated to encounter processing activity upstream of the fist seal element. The first seal element has a deflectable portion and a protrusion extending radially from the deflectable portion. The second seal element has a radially extending recess in which the protrusion of the first seal element is received. The protrusion and recess interlock to restrict separation and/or rotation of the first and second seal elements. Inclined surfaces of the first seal element interact with the second seal element to apply axial sealing forces to sealing surfaces of the second seal member.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CYLINDERS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ENGINEERING ELEMENTS AND UNITS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; PISTONS ; SEALINGS ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; THERMAL INSULATION IN GENERAL ; WEAPONS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140107&DB=EPODOC&CC=US&NR=8623145B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140107&DB=EPODOC&CC=US&NR=8623145B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>COPPOLA STEPHEN</creatorcontrib><creatorcontrib>NAVARRO JEFF</creatorcontrib><creatorcontrib>BOWMAN DON</creatorcontrib><creatorcontrib>CORNETT KENNETH W</creatorcontrib><creatorcontrib>SCHENK DOUGLAS C</creatorcontrib><creatorcontrib>KAMIBAYASHIYAMA JULIAN</creatorcontrib><creatorcontrib>FUNKE DAN</creatorcontrib><creatorcontrib>PAYNE JEREMY M</creatorcontrib><creatorcontrib>PETERSON DONALD J</creatorcontrib><title>Substrate processing apparatus with composite seal</title><description>A seal for sealing an interface between a container and a lid of a process chamber. The seal comprises a first seal element and a second seal element that are arranged to seal the interface in series, with the second seal element being situated to encounter processing activity upstream of the fist seal element. The first seal element has a deflectable portion and a protrusion extending radially from the deflectable portion. The second seal element has a radially extending recess in which the protrusion of the first seal element is received. The protrusion and recess interlock to restrict separation and/or rotation of the first and second seal elements. Inclined surfaces of the first seal element interact with the second seal element to apply axial sealing forces to sealing surfaces of the second seal member.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CYLINDERS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>PISTONS</subject><subject>SEALINGS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAKLk0qLilKLElVKCjKT04tLs7MS1dILChIBIqVFiuUZ5ZkKCTn5xbkF2cC1RSnJubwMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JL40GALMyNjQxNTJyNjIpQAAMquLIQ</recordid><startdate>20140107</startdate><enddate>20140107</enddate><creator>COPPOLA STEPHEN</creator><creator>NAVARRO JEFF</creator><creator>BOWMAN DON</creator><creator>CORNETT KENNETH W</creator><creator>SCHENK DOUGLAS C</creator><creator>KAMIBAYASHIYAMA JULIAN</creator><creator>FUNKE DAN</creator><creator>PAYNE JEREMY M</creator><creator>PETERSON DONALD J</creator><scope>EVB</scope></search><sort><creationdate>20140107</creationdate><title>Substrate processing apparatus with composite seal</title><author>COPPOLA STEPHEN ; NAVARRO JEFF ; BOWMAN DON ; CORNETT KENNETH W ; SCHENK DOUGLAS C ; KAMIBAYASHIYAMA JULIAN ; FUNKE DAN ; PAYNE JEREMY M ; PETERSON DONALD J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8623145B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CYLINDERS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>PISTONS</topic><topic>SEALINGS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>COPPOLA STEPHEN</creatorcontrib><creatorcontrib>NAVARRO JEFF</creatorcontrib><creatorcontrib>BOWMAN DON</creatorcontrib><creatorcontrib>CORNETT KENNETH W</creatorcontrib><creatorcontrib>SCHENK DOUGLAS C</creatorcontrib><creatorcontrib>KAMIBAYASHIYAMA JULIAN</creatorcontrib><creatorcontrib>FUNKE DAN</creatorcontrib><creatorcontrib>PAYNE JEREMY M</creatorcontrib><creatorcontrib>PETERSON DONALD J</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>COPPOLA STEPHEN</au><au>NAVARRO JEFF</au><au>BOWMAN DON</au><au>CORNETT KENNETH W</au><au>SCHENK DOUGLAS C</au><au>KAMIBAYASHIYAMA JULIAN</au><au>FUNKE DAN</au><au>PAYNE JEREMY M</au><au>PETERSON DONALD J</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate processing apparatus with composite seal</title><date>2014-01-07</date><risdate>2014</risdate><abstract>A seal for sealing an interface between a container and a lid of a process chamber. The seal comprises a first seal element and a second seal element that are arranged to seal the interface in series, with the second seal element being situated to encounter processing activity upstream of the fist seal element. The first seal element has a deflectable portion and a protrusion extending radially from the deflectable portion. The second seal element has a radially extending recess in which the protrusion of the first seal element is received. The protrusion and recess interlock to restrict separation and/or rotation of the first and second seal elements. Inclined surfaces of the first seal element interact with the second seal element to apply axial sealing forces to sealing surfaces of the second seal member.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US8623145B2 |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CYLINDERS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY PISTONS SEALINGS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THERMAL INSULATION IN GENERAL WEAPONS |
title | Substrate processing apparatus with composite seal |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T03%3A39%3A45IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=COPPOLA%20STEPHEN&rft.date=2014-01-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8623145B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |