Measuring bias temperature instability induced ring oscillator frequency degradation

A method establishes an initial voltage in a ring oscillator and a logic circuit of an integrated circuit device. Following this, the method enables the operating state of the ring oscillator. After enabling the operating state of the ring oscillator, the method steps up to a stressing voltage in th...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BROCHU, JR. DAVID G, IOANNOU DIMITRIS P, MERRILL TRAVIS S, MITTL STEVEN W
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator BROCHU, JR. DAVID G
IOANNOU DIMITRIS P
MERRILL TRAVIS S
MITTL STEVEN W
description A method establishes an initial voltage in a ring oscillator and a logic circuit of an integrated circuit device. Following this, the method enables the operating state of the ring oscillator. After enabling the operating state of the ring oscillator, the method steps up to a stressing voltage in the ring oscillator. The initial voltage is approximately one-half the stressing voltage. The stressing voltage creates operating-level stress within the ring oscillator. The method measures the operating-level frequency within the ring oscillator using an oscilloscope (after stepping up to the stressing voltage).
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8587383B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8587383B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8587383B23</originalsourceid><addsrcrecordid>eNqNyjEOwjAQBVE3FAi4w16AhgjhGgSioSLU0cb-iVYydrDXRW4PQhyAaqZ4S9PewKVmiSP1woUUzwmZtWaQxKLcSxCdP--rg6evTMVJCKwp05DxqohuJo8xs2eVFNdmMXAo2Py6MnQ5t6frFlPqUCZ2iNDucbd7e2hsc9w1f5A3xh854Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Measuring bias temperature instability induced ring oscillator frequency degradation</title><source>esp@cenet</source><creator>BROCHU, JR. DAVID G ; IOANNOU DIMITRIS P ; MERRILL TRAVIS S ; MITTL STEVEN W</creator><creatorcontrib>BROCHU, JR. DAVID G ; IOANNOU DIMITRIS P ; MERRILL TRAVIS S ; MITTL STEVEN W</creatorcontrib><description>A method establishes an initial voltage in a ring oscillator and a logic circuit of an integrated circuit device. Following this, the method enables the operating state of the ring oscillator. After enabling the operating state of the ring oscillator, the method steps up to a stressing voltage in the ring oscillator. The initial voltage is approximately one-half the stressing voltage. The stressing voltage creates operating-level stress within the ring oscillator. The method measures the operating-level frequency within the ring oscillator using an oscilloscope (after stepping up to the stressing voltage).</description><language>eng</language><subject>BASIC ELECTRONIC CIRCUITRY ; ELECTRICITY ; MEASURING ; MEASURING ELECTRIC VARIABLES ; MEASURING MAGNETIC VARIABLES ; PHYSICS ; PULSE TECHNIQUE ; TESTING</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20131119&amp;DB=EPODOC&amp;CC=US&amp;NR=8587383B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20131119&amp;DB=EPODOC&amp;CC=US&amp;NR=8587383B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BROCHU, JR. DAVID G</creatorcontrib><creatorcontrib>IOANNOU DIMITRIS P</creatorcontrib><creatorcontrib>MERRILL TRAVIS S</creatorcontrib><creatorcontrib>MITTL STEVEN W</creatorcontrib><title>Measuring bias temperature instability induced ring oscillator frequency degradation</title><description>A method establishes an initial voltage in a ring oscillator and a logic circuit of an integrated circuit device. Following this, the method enables the operating state of the ring oscillator. After enabling the operating state of the ring oscillator, the method steps up to a stressing voltage in the ring oscillator. The initial voltage is approximately one-half the stressing voltage. The stressing voltage creates operating-level stress within the ring oscillator. The method measures the operating-level frequency within the ring oscillator using an oscilloscope (after stepping up to the stressing voltage).</description><subject>BASIC ELECTRONIC CIRCUITRY</subject><subject>ELECTRICITY</subject><subject>MEASURING</subject><subject>MEASURING ELECTRIC VARIABLES</subject><subject>MEASURING MAGNETIC VARIABLES</subject><subject>PHYSICS</subject><subject>PULSE TECHNIQUE</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEOwjAQBVE3FAi4w16AhgjhGgSioSLU0cb-iVYydrDXRW4PQhyAaqZ4S9PewKVmiSP1woUUzwmZtWaQxKLcSxCdP--rg6evTMVJCKwp05DxqohuJo8xs2eVFNdmMXAo2Py6MnQ5t6frFlPqUCZ2iNDucbd7e2hsc9w1f5A3xh854Q</recordid><startdate>20131119</startdate><enddate>20131119</enddate><creator>BROCHU, JR. DAVID G</creator><creator>IOANNOU DIMITRIS P</creator><creator>MERRILL TRAVIS S</creator><creator>MITTL STEVEN W</creator><scope>EVB</scope></search><sort><creationdate>20131119</creationdate><title>Measuring bias temperature instability induced ring oscillator frequency degradation</title><author>BROCHU, JR. DAVID G ; IOANNOU DIMITRIS P ; MERRILL TRAVIS S ; MITTL STEVEN W</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8587383B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>BASIC ELECTRONIC CIRCUITRY</topic><topic>ELECTRICITY</topic><topic>MEASURING</topic><topic>MEASURING ELECTRIC VARIABLES</topic><topic>MEASURING MAGNETIC VARIABLES</topic><topic>PHYSICS</topic><topic>PULSE TECHNIQUE</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>BROCHU, JR. DAVID G</creatorcontrib><creatorcontrib>IOANNOU DIMITRIS P</creatorcontrib><creatorcontrib>MERRILL TRAVIS S</creatorcontrib><creatorcontrib>MITTL STEVEN W</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BROCHU, JR. DAVID G</au><au>IOANNOU DIMITRIS P</au><au>MERRILL TRAVIS S</au><au>MITTL STEVEN W</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Measuring bias temperature instability induced ring oscillator frequency degradation</title><date>2013-11-19</date><risdate>2013</risdate><abstract>A method establishes an initial voltage in a ring oscillator and a logic circuit of an integrated circuit device. Following this, the method enables the operating state of the ring oscillator. After enabling the operating state of the ring oscillator, the method steps up to a stressing voltage in the ring oscillator. The initial voltage is approximately one-half the stressing voltage. The stressing voltage creates operating-level stress within the ring oscillator. The method measures the operating-level frequency within the ring oscillator using an oscilloscope (after stepping up to the stressing voltage).</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US8587383B2
source esp@cenet
subjects BASIC ELECTRONIC CIRCUITRY
ELECTRICITY
MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
PHYSICS
PULSE TECHNIQUE
TESTING
title Measuring bias temperature instability induced ring oscillator frequency degradation
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T18%3A17%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=BROCHU,%20JR.%20DAVID%20G&rft.date=2013-11-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8587383B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true