Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same

Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced...

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Hauptverfasser: FUTRELL JOHN R. C, RUSSELL EZEQUIEL VIDAL, STANTON WILLIAM A
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creator FUTRELL JOHN R. C
RUSSELL EZEQUIEL VIDAL
STANTON WILLIAM A
description Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced in an optical proximity correction simulation of a target geometry. The target geometry may comprise a plurality of line segments, each line segment of the plurality having one evaluation point defined thereon. The method may further comprise shifting at least one evaluation point to an associated point on the predicted contour of the image.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8584058B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8584058B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8584058B23</originalsourceid><addsrcrecordid>eNqNzTEKAjEQheE0FqLeYS4giLqQ2kWxsVLrZUhmdSA7E5KsaOXVRd1arF7xPvjH5nmgclWfodUEnloWlgvQDUOPhVUgKkv53hoLOwwQk9654_IApymR-zgU_xt0Q4jFhd6_Kxk7mppRiyHTbNiJgd32VO_nFLWhHNGRUGnOR1vZ9aKym-XqD_ICRZZKWw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same</title><source>esp@cenet</source><creator>FUTRELL JOHN R. C ; RUSSELL EZEQUIEL VIDAL ; STANTON WILLIAM A</creator><creatorcontrib>FUTRELL JOHN R. C ; RUSSELL EZEQUIEL VIDAL ; STANTON WILLIAM A</creatorcontrib><description>Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced in an optical proximity correction simulation of a target geometry. The target geometry may comprise a plurality of line segments, each line segment of the plurality having one evaluation point defined thereon. The method may further comprise shifting at least one evaluation point to an associated point on the predicted contour of the image.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20131112&amp;DB=EPODOC&amp;CC=US&amp;NR=8584058B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20131112&amp;DB=EPODOC&amp;CC=US&amp;NR=8584058B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUTRELL JOHN R. C</creatorcontrib><creatorcontrib>RUSSELL EZEQUIEL VIDAL</creatorcontrib><creatorcontrib>STANTON WILLIAM A</creatorcontrib><title>Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same</title><description>Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced in an optical proximity correction simulation of a target geometry. The target geometry may comprise a plurality of line segments, each line segment of the plurality having one evaluation point defined thereon. The method may further comprise shifting at least one evaluation point to an associated point on the predicted contour of the image.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzTEKAjEQheE0FqLeYS4giLqQ2kWxsVLrZUhmdSA7E5KsaOXVRd1arF7xPvjH5nmgclWfodUEnloWlgvQDUOPhVUgKkv53hoLOwwQk9654_IApymR-zgU_xt0Q4jFhd6_Kxk7mppRiyHTbNiJgd32VO_nFLWhHNGRUGnOR1vZ9aKym-XqD_ICRZZKWw</recordid><startdate>20131112</startdate><enddate>20131112</enddate><creator>FUTRELL JOHN R. C</creator><creator>RUSSELL EZEQUIEL VIDAL</creator><creator>STANTON WILLIAM A</creator><scope>EVB</scope></search><sort><creationdate>20131112</creationdate><title>Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same</title><author>FUTRELL JOHN R. C ; RUSSELL EZEQUIEL VIDAL ; STANTON WILLIAM A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8584058B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>FUTRELL JOHN R. C</creatorcontrib><creatorcontrib>RUSSELL EZEQUIEL VIDAL</creatorcontrib><creatorcontrib>STANTON WILLIAM A</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FUTRELL JOHN R. C</au><au>RUSSELL EZEQUIEL VIDAL</au><au>STANTON WILLIAM A</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same</title><date>2013-11-12</date><risdate>2013</risdate><abstract>Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced in an optical proximity correction simulation of a target geometry. The target geometry may comprise a plurality of line segments, each line segment of the plurality having one evaluation point defined thereon. The method may further comprise shifting at least one evaluation point to an associated point on the predicted contour of the image.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CALCULATING
CINEMATOGRAPHY
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T16%3A11%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=FUTRELL%20JOHN%20R.%20C&rft.date=2013-11-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8584058B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true