Pattern recognition with edge correction for design based metrology

A method for edge correction in pattern recognition includes generating a pattern recognition output for a pattern recognition process, including receiving, in the processor, a design layout, receiving a sample plan based on the design layout, receiving a first user-generated edge input, generating...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: FISCHER DANIEL S, SHAO DONGBING, BAILEY TODD C
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator FISCHER DANIEL S
SHAO DONGBING
BAILEY TODD C
description A method for edge correction in pattern recognition includes generating a pattern recognition output for a pattern recognition process, including receiving, in the processor, a design layout, receiving a sample plan based on the design layout, receiving a first user-generated edge input, generating a pattern recognition recipe output from the design layout, the sample plan and the user-generated edge input, wherein the pattern recognition recipe output is configured to drive the pattern recognition process, generating a measurement model from the pattern recognition process, generating a measurement model pattern recognition output for an measurement model pattern recognition process, including receiving a second user-generated input and generating a measurement model pattern recognition recipe output from the measurement model and the second user-generated edge input, wherein the measurement model pattern recognition recipe output configured to drive the measurement model pattern recognition process.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8495527B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8495527B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8495527B23</originalsourceid><addsrcrecordid>eNrjZHAOSCwpSS3KUyhKTc5Pz8ssyczPUyjPLMlQSE1JT1VIzi8CSoAF0_KLFFJSizPT8xSSEotTUxRyU0uK8nPy0yt5GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakl8aLCFiaWpqZG5k5ExEUoAUjUytg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Pattern recognition with edge correction for design based metrology</title><source>esp@cenet</source><creator>FISCHER DANIEL S ; SHAO DONGBING ; BAILEY TODD C</creator><creatorcontrib>FISCHER DANIEL S ; SHAO DONGBING ; BAILEY TODD C</creatorcontrib><description>A method for edge correction in pattern recognition includes generating a pattern recognition output for a pattern recognition process, including receiving, in the processor, a design layout, receiving a sample plan based on the design layout, receiving a first user-generated edge input, generating a pattern recognition recipe output from the design layout, the sample plan and the user-generated edge input, wherein the pattern recognition recipe output is configured to drive the pattern recognition process, generating a measurement model from the pattern recognition process, generating a measurement model pattern recognition output for an measurement model pattern recognition process, including receiving a second user-generated input and generating a measurement model pattern recognition recipe output from the measurement model and the second user-generated edge input, wherein the measurement model pattern recognition recipe output configured to drive the measurement model pattern recognition process.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20130723&amp;DB=EPODOC&amp;CC=US&amp;NR=8495527B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20130723&amp;DB=EPODOC&amp;CC=US&amp;NR=8495527B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FISCHER DANIEL S</creatorcontrib><creatorcontrib>SHAO DONGBING</creatorcontrib><creatorcontrib>BAILEY TODD C</creatorcontrib><title>Pattern recognition with edge correction for design based metrology</title><description>A method for edge correction in pattern recognition includes generating a pattern recognition output for a pattern recognition process, including receiving, in the processor, a design layout, receiving a sample plan based on the design layout, receiving a first user-generated edge input, generating a pattern recognition recipe output from the design layout, the sample plan and the user-generated edge input, wherein the pattern recognition recipe output is configured to drive the pattern recognition process, generating a measurement model from the pattern recognition process, generating a measurement model pattern recognition output for an measurement model pattern recognition process, including receiving a second user-generated input and generating a measurement model pattern recognition recipe output from the measurement model and the second user-generated edge input, wherein the measurement model pattern recognition recipe output configured to drive the measurement model pattern recognition process.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>ELECTROGRAPHY</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><subject>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAOSCwpSS3KUyhKTc5Pz8ssyczPUyjPLMlQSE1JT1VIzi8CSoAF0_KLFFJSizPT8xSSEotTUxRyU0uK8nPy0yt5GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakl8aLCFiaWpqZG5k5ExEUoAUjUytg</recordid><startdate>20130723</startdate><enddate>20130723</enddate><creator>FISCHER DANIEL S</creator><creator>SHAO DONGBING</creator><creator>BAILEY TODD C</creator><scope>EVB</scope></search><sort><creationdate>20130723</creationdate><title>Pattern recognition with edge correction for design based metrology</title><author>FISCHER DANIEL S ; SHAO DONGBING ; BAILEY TODD C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8495527B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>ELECTROGRAPHY</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><topic>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</topic><toplevel>online_resources</toplevel><creatorcontrib>FISCHER DANIEL S</creatorcontrib><creatorcontrib>SHAO DONGBING</creatorcontrib><creatorcontrib>BAILEY TODD C</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FISCHER DANIEL S</au><au>SHAO DONGBING</au><au>BAILEY TODD C</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Pattern recognition with edge correction for design based metrology</title><date>2013-07-23</date><risdate>2013</risdate><abstract>A method for edge correction in pattern recognition includes generating a pattern recognition output for a pattern recognition process, including receiving, in the processor, a design layout, receiving a sample plan based on the design layout, receiving a first user-generated edge input, generating a pattern recognition recipe output from the design layout, the sample plan and the user-generated edge input, wherein the pattern recognition recipe output is configured to drive the pattern recognition process, generating a measurement model from the pattern recognition process, generating a measurement model pattern recognition output for an measurement model pattern recognition process, including receiving a second user-generated input and generating a measurement model pattern recognition recipe output from the measurement model and the second user-generated edge input, wherein the measurement model pattern recognition recipe output configured to drive the measurement model pattern recognition process.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US8495527B2
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CALCULATING
CINEMATOGRAPHY
CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
ELECTROGRAPHY
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
title Pattern recognition with edge correction for design based metrology
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T00%3A24%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=FISCHER%20DANIEL%20S&rft.date=2013-07-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8495527B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true