Method of forming openings in a semiconductor device and a semiconductor device fabricated by the method

A method of forming openings to a layer of a semiconductor device comprises forming a dielectric layer over the layer of the semiconductor device, and forming a mask over the dielectric layer. The mask comprises a plurality of mask openings arranged in a regular pattern extending over the dielectric...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WARRICK SCOTT, CONLEY WILL, AMINPUR MASSUD ABUBAKER, RIVIERE-CAZEAUX LIONEL
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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