Uniformity of a scanned ion beam
One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan...
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| creator | RAY ANDY VANDERBERG BO H EISNER EDWARD C |
| description | One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan the ion beam across the surface of the workpiece along a second axis. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8378313B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8378313B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8378313B23</originalsourceid><addsrcrecordid>eNrjZFAIzctMyy_KzSypVMhPU0hUKE5OzMtLTVHIzM9TSEpNzOVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwRbG5hbGhsZORsZEKAEA6NIkng</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Uniformity of a scanned ion beam</title><source>esp@cenet</source><creator>RAY ANDY ; VANDERBERG BO H ; EISNER EDWARD C</creator><creatorcontrib>RAY ANDY ; VANDERBERG BO H ; EISNER EDWARD C</creatorcontrib><description>One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan the ion beam across the surface of the workpiece along a second axis.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; GAMMA RAY OR X-RAY MICROSCOPES ; IRRADIATION DEVICES ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; PHYSICS ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130219&DB=EPODOC&CC=US&NR=8378313B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130219&DB=EPODOC&CC=US&NR=8378313B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RAY ANDY</creatorcontrib><creatorcontrib>VANDERBERG BO H</creatorcontrib><creatorcontrib>EISNER EDWARD C</creatorcontrib><title>Uniformity of a scanned ion beam</title><description>One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan the ion beam across the surface of the workpiece along a second axis.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>IRRADIATION DEVICES</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>PHYSICS</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAIzctMyy_KzSypVMhPU0hUKE5OzMtLTVHIzM9TSEpNzOVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwRbG5hbGhsZORsZEKAEA6NIkng</recordid><startdate>20130219</startdate><enddate>20130219</enddate><creator>RAY ANDY</creator><creator>VANDERBERG BO H</creator><creator>EISNER EDWARD C</creator><scope>EVB</scope></search><sort><creationdate>20130219</creationdate><title>Uniformity of a scanned ion beam</title><author>RAY ANDY ; VANDERBERG BO H ; EISNER EDWARD C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8378313B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>IRRADIATION DEVICES</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>PHYSICS</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><toplevel>online_resources</toplevel><creatorcontrib>RAY ANDY</creatorcontrib><creatorcontrib>VANDERBERG BO H</creatorcontrib><creatorcontrib>EISNER EDWARD C</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RAY ANDY</au><au>VANDERBERG BO H</au><au>EISNER EDWARD C</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Uniformity of a scanned ion beam</title><date>2013-02-19</date><risdate>2013</risdate><abstract>One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan the ion beam across the surface of the workpiece along a second axis.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR |
| title | Uniformity of a scanned ion beam |
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