Pattern dimension calculation method and computer program product

Pattern dimension calculation method and computer program product

A pattern dimension calculation method according to one embodiment calculates a taper shape of a mask member used as a mask when a circuit pattern is processed in an upper layer of the circuit pattern formed on a substrate. The method calculates an opening angle facing the mask member from a shape p...

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Hauptverfasser: MASHITA HIROMITSU, NAKAJIMA FUMIHARU, KODAMA CHIKAAKI, KOTANI TOSHIYA, TAGUCHI TAKAFUMI, ABURADA RYOTA
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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creator MASHITA HIROMITSU
NAKAJIMA FUMIHARU
KODAMA CHIKAAKI
KOTANI TOSHIYA
TAGUCHI TAKAFUMI
ABURADA RYOTA
description A pattern dimension calculation method according to one embodiment calculates a taper shape of a mask member used as a mask when a circuit pattern is processed in an upper layer of the circuit pattern formed on a substrate. The method calculates an opening angle facing the mask member from a shape prediction position on the circuit pattern on the basis of the taper shape. The method calculates a dimension of the circuit pattern according to the opening angle formed at the shape prediction position.
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subjects CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
title Pattern dimension calculation method and computer program product
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