Exposure apparatus and measuring device for a projection lens
A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer...
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| creator | GRUNER TORALF MALLMANN JOERG KNEER BERNHARD WEGMANN ULRICH KUGLER JENS SCHUSTER KARL-HEINZ EHRMANN ALBRECHT LOERING ULRICH GEUPPERT BERNHARD SORG FRANZ WABRA NORBERT HOCH RAINER |
| description | A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8330935B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8330935B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8330935B23</originalsourceid><addsrcrecordid>eNrjZLB1rSjILy4tSlVILChILEosKS1WSMxLUchNTQSKZualK6SklmUmpyqk5RcpJCoUFOVnpSaXZObnKeSk5hXzMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JL40GALY2MDS2NTJyNjIpQAAOOAMCU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Exposure apparatus and measuring device for a projection lens</title><source>esp@cenet</source><creator>GRUNER TORALF ; MALLMANN JOERG ; KNEER BERNHARD ; WEGMANN ULRICH ; KUGLER JENS ; SCHUSTER KARL-HEINZ ; EHRMANN ALBRECHT ; LOERING ULRICH ; GEUPPERT BERNHARD ; SORG FRANZ ; WABRA NORBERT ; HOCH RAINER</creator><creatorcontrib>GRUNER TORALF ; MALLMANN JOERG ; KNEER BERNHARD ; WEGMANN ULRICH ; KUGLER JENS ; SCHUSTER KARL-HEINZ ; EHRMANN ALBRECHT ; LOERING ULRICH ; GEUPPERT BERNHARD ; SORG FRANZ ; WABRA NORBERT ; HOCH RAINER</creatorcontrib><description>A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20121211&DB=EPODOC&CC=US&NR=8330935B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20121211&DB=EPODOC&CC=US&NR=8330935B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GRUNER TORALF</creatorcontrib><creatorcontrib>MALLMANN JOERG</creatorcontrib><creatorcontrib>KNEER BERNHARD</creatorcontrib><creatorcontrib>WEGMANN ULRICH</creatorcontrib><creatorcontrib>KUGLER JENS</creatorcontrib><creatorcontrib>SCHUSTER KARL-HEINZ</creatorcontrib><creatorcontrib>EHRMANN ALBRECHT</creatorcontrib><creatorcontrib>LOERING ULRICH</creatorcontrib><creatorcontrib>GEUPPERT BERNHARD</creatorcontrib><creatorcontrib>SORG FRANZ</creatorcontrib><creatorcontrib>WABRA NORBERT</creatorcontrib><creatorcontrib>HOCH RAINER</creatorcontrib><title>Exposure apparatus and measuring device for a projection lens</title><description>A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB1rSjILy4tSlVILChILEosKS1WSMxLUchNTQSKZualK6SklmUmpyqk5RcpJCoUFOVnpSaXZObnKeSk5hXzMLCmJeYUp_JCaW4GBTfXEGcP3dSC_PjU4oLE5NS81JL40GALY2MDS2NTJyNjIpQAAOOAMCU</recordid><startdate>20121211</startdate><enddate>20121211</enddate><creator>GRUNER TORALF</creator><creator>MALLMANN JOERG</creator><creator>KNEER BERNHARD</creator><creator>WEGMANN ULRICH</creator><creator>KUGLER JENS</creator><creator>SCHUSTER KARL-HEINZ</creator><creator>EHRMANN ALBRECHT</creator><creator>LOERING ULRICH</creator><creator>GEUPPERT BERNHARD</creator><creator>SORG FRANZ</creator><creator>WABRA NORBERT</creator><creator>HOCH RAINER</creator><scope>EVB</scope></search><sort><creationdate>20121211</creationdate><title>Exposure apparatus and measuring device for a projection lens</title><author>GRUNER TORALF ; MALLMANN JOERG ; KNEER BERNHARD ; WEGMANN ULRICH ; KUGLER JENS ; SCHUSTER KARL-HEINZ ; EHRMANN ALBRECHT ; LOERING ULRICH ; GEUPPERT BERNHARD ; SORG FRANZ ; WABRA NORBERT ; HOCH RAINER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8330935B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>GRUNER TORALF</creatorcontrib><creatorcontrib>MALLMANN JOERG</creatorcontrib><creatorcontrib>KNEER BERNHARD</creatorcontrib><creatorcontrib>WEGMANN ULRICH</creatorcontrib><creatorcontrib>KUGLER JENS</creatorcontrib><creatorcontrib>SCHUSTER KARL-HEINZ</creatorcontrib><creatorcontrib>EHRMANN ALBRECHT</creatorcontrib><creatorcontrib>LOERING ULRICH</creatorcontrib><creatorcontrib>GEUPPERT BERNHARD</creatorcontrib><creatorcontrib>SORG FRANZ</creatorcontrib><creatorcontrib>WABRA NORBERT</creatorcontrib><creatorcontrib>HOCH RAINER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GRUNER TORALF</au><au>MALLMANN JOERG</au><au>KNEER BERNHARD</au><au>WEGMANN ULRICH</au><au>KUGLER JENS</au><au>SCHUSTER KARL-HEINZ</au><au>EHRMANN ALBRECHT</au><au>LOERING ULRICH</au><au>GEUPPERT BERNHARD</au><au>SORG FRANZ</au><au>WABRA NORBERT</au><au>HOCH RAINER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Exposure apparatus and measuring device for a projection lens</title><date>2012-12-11</date><risdate>2012</risdate><abstract>A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Exposure apparatus and measuring device for a projection lens |
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