Methods for normalizing strain in semiconductor devices and strain normalized semiconductor devices

A method of normalizing strain in semiconductor devices and normalized strain semiconductor devices. The method includes: forming first and second field effect transistors of an integrated circuit; forming a stress layer over the first and second field effect transistors, the stress layer inducing s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ELLIS-MONAGHAN JOHN JOSEPH, BERNSTEIN KERRY, HABIB NAZMUL, BALCH BRUCE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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