Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs

Methods for producing in-situ grooves in CMP pads are provided. In general, the methods for producing in-situ grooves comprise the steps of patterning a silicone lining, placing the silicone lining in, or on, a mold, adding CMP pad material to the silicone lining, and allowing the CMP pad to solidif...

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Bibliographische Detailangaben
Hauptverfasser: ROY PRADIP K, VAIDYA HEM M, DEOPURA MANISH
Format: Patent
Sprache:eng
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