Pattern inspection apparatus, corrected image generation method, and computer-readable recording medium storing program

A pattern inspection apparatus includes a first unit configured to acquire an optical image of a target workpiece to be inspected, a second unit configured to generate a reference image to be compared, a third unit configured, by using a mathematical model in which a parallel shift amount, an expans...

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1. Verfasser:	YAMASHITA KYOJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	YAMASHITA KYOJI
description	A pattern inspection apparatus includes a first unit configured to acquire an optical image of a target workpiece to be inspected, a second unit configured to generate a reference image to be compared, a third unit configured, by using a mathematical model in which a parallel shift amount, an expansion and contraction error coefficient, a rotation error coefficient, a gray-level offset and an image transmission loss ratio are parameters, to calculate each of the parameters by a least-squares method, a forth unit configured to generate a corrected image by shifting a position of the reference image by a displacement amount, based on the each of the parameters, and a fifth unit configured to compare the corrected image with the optical image.
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	Pattern inspection apparatus, corrected image generation method, and computer-readable recording medium storing program
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