Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers
Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the mea...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | ADEL MIKE IZIKSON PAVEL ROBINSON JOHN CHOI DONGSUB MARCHELLI ANAT WIDMANN AMIR |
description | Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8175831B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8175831B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8175831B23</originalsourceid><addsrcrecordid>eNqNjTsOwjAMhrswIOAOvgBDqRDMIBALEzBXVvKXVGoeilNVvQHHJkWwM9n-_D_mxeuKZLwWYqdJRkmwQo2PpCI4te5JeQ-IGdnpYtKjY9sqErahm5AoA4uPiSlEryBCuo_TbzCtMmTB0scscikXRfwCock7GrhBlGUxa7gTrL5zUdD5dD9e1gi-hgRWcEj147Yvd9t9VR421R-SN2tRTGM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers</title><source>esp@cenet</source><creator>ADEL MIKE ; IZIKSON PAVEL ; ROBINSON JOHN ; CHOI DONGSUB ; MARCHELLI ANAT ; WIDMANN AMIR</creator><creatorcontrib>ADEL MIKE ; IZIKSON PAVEL ; ROBINSON JOHN ; CHOI DONGSUB ; MARCHELLI ANAT ; WIDMANN AMIR</creatorcontrib><description>Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.</description><language>eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120508&DB=EPODOC&CC=US&NR=8175831B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120508&DB=EPODOC&CC=US&NR=8175831B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ADEL MIKE</creatorcontrib><creatorcontrib>IZIKSON PAVEL</creatorcontrib><creatorcontrib>ROBINSON JOHN</creatorcontrib><creatorcontrib>CHOI DONGSUB</creatorcontrib><creatorcontrib>MARCHELLI ANAT</creatorcontrib><creatorcontrib>WIDMANN AMIR</creatorcontrib><title>Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers</title><description>Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjTsOwjAMhrswIOAOvgBDqRDMIBALEzBXVvKXVGoeilNVvQHHJkWwM9n-_D_mxeuKZLwWYqdJRkmwQo2PpCI4te5JeQ-IGdnpYtKjY9sqErahm5AoA4uPiSlEryBCuo_TbzCtMmTB0scscikXRfwCock7GrhBlGUxa7gTrL5zUdD5dD9e1gi-hgRWcEj147Yvd9t9VR421R-SN2tRTGM</recordid><startdate>20120508</startdate><enddate>20120508</enddate><creator>ADEL MIKE</creator><creator>IZIKSON PAVEL</creator><creator>ROBINSON JOHN</creator><creator>CHOI DONGSUB</creator><creator>MARCHELLI ANAT</creator><creator>WIDMANN AMIR</creator><scope>EVB</scope></search><sort><creationdate>20120508</creationdate><title>Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers</title><author>ADEL MIKE ; IZIKSON PAVEL ; ROBINSON JOHN ; CHOI DONGSUB ; MARCHELLI ANAT ; WIDMANN AMIR</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8175831B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ADEL MIKE</creatorcontrib><creatorcontrib>IZIKSON PAVEL</creatorcontrib><creatorcontrib>ROBINSON JOHN</creatorcontrib><creatorcontrib>CHOI DONGSUB</creatorcontrib><creatorcontrib>MARCHELLI ANAT</creatorcontrib><creatorcontrib>WIDMANN AMIR</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ADEL MIKE</au><au>IZIKSON PAVEL</au><au>ROBINSON JOHN</au><au>CHOI DONGSUB</au><au>MARCHELLI ANAT</au><au>WIDMANN AMIR</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers</title><date>2012-05-08</date><risdate>2012</risdate><abstract>Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US8175831B2 |
source | esp@cenet |
subjects | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING |
title | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T03%3A49%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ADEL%20MIKE&rft.date=2012-05-08&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8175831B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |