Illumination system for illuminating a mask in a microlithographic projection exposure apparatus

An illumination system for illuminating a mask in a microlithographic projection exposure apparatus includes an array of mirrors or other beam deflecting elements. Each beam deflecting element produces on the surface a projection light spot at a position that is variable by changing a deflection ang...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MAJOR ANDRAS G
Format:	Patent
Sprache:	eng
Schlagworte:	COLORIMETRY MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING PHYSICS RADIATION PYROMETRY TESTING
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