CVD coating device

The invention relates to a method for depositing especially crystalline layers on one or more, especially crystalline substrates in a process chamber by means of reaction gases that are introduced into the process chamber and that undergo especially pyrolitic reactions. The device comprises a suppor...

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1. Verfasser: KAEPPELER JOHANNES
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creator KAEPPELER JOHANNES
description The invention relates to a method for depositing especially crystalline layers on one or more, especially crystalline substrates in a process chamber by means of reaction gases that are introduced into the process chamber and that undergo especially pyrolitic reactions. The device comprises a support plate, heated from one side, on which at least one compensation plate rests while forming a horizontal gap. In order to be better able to influence the surface temperature, the gap height of the horizontal gap can be varied or is locally variable in order to influence the local surface temperature of the compensation plate.
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title CVD coating device
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