Wafer processing system, wafer processing method, and ion implantation system

Two load lock chambers having a load lock pedestal are provided adjacent to a vacuum process chamber through a vacuum intermediate chamber. A passage opening is provided between the vacuum process chamber and the vacuum intermediate chamber. Two wafer retaining arms are installed between a platen de...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SATO FUMIAKI, OKADA KEIJI, NAKAOKA HIROAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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