Ion implanter, internal structure of ion implanter and method of forming a coating layer in the ion implanter

An ion implanter includes a process chamber and a coating layer. The process chamber receives a substrate and provides a space to perform an ion implantation process on the substrate. The coating layer is disposed on an inner wall of the process chamber to reduce contamination of the substrate and i...

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Hauptverfasser:	KIM SAM-WOONG, JANG KYUNG-IC, YE KYUNG-HWAN, REIM YONG-SUP
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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creator	KIM SAM-WOONG JANG KYUNG-IC YE KYUNG-HWAN REIM YONG-SUP
description	An ion implanter includes a process chamber and a coating layer. The process chamber receives a substrate and provides a space to perform an ion implantation process on the substrate. The coating layer is disposed on an inner wall of the process chamber to reduce contamination of the substrate and includes the same material as that of the substrate.
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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
title	Ion implanter, internal structure of ion implanter and method of forming a coating layer in the ion implanter
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