Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample

The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, an...

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Hauptverfasser: VAN BRUG HEDSER, BROUWER EGBERT ANNE MARTIJN
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creator VAN BRUG HEDSER
BROUWER EGBERT ANNE MARTIJN
description The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8064038B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8064038B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8064038B23</originalsourceid><addsrcrecordid>eNqNjL0KwkAQhNNYiPoO-wAKwYikjihaq3VY7ja5g_tZbi-Kb-8VYmVhNfDNNzOvpksQJpVtDIDMmDBPsgZns4ljQjZWgbwkkwdO8WE1aXiWErIhsD-2gEEDgqdyoGGI6WuFsXBBz46W1WxAJ7T65KKC0_F2OG-IY0_CqChQ7u_Xtt7v6qbtts0fyhvOpkWe</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample</title><source>esp@cenet</source><creator>VAN BRUG HEDSER ; BROUWER EGBERT ANNE MARTIJN</creator><creatorcontrib>VAN BRUG HEDSER ; BROUWER EGBERT ANNE MARTIJN</creatorcontrib><description>The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; PHOTOGRAPHY ; PHYSICS</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20111122&amp;DB=EPODOC&amp;CC=US&amp;NR=8064038B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20111122&amp;DB=EPODOC&amp;CC=US&amp;NR=8064038B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN BRUG HEDSER</creatorcontrib><creatorcontrib>BROUWER EGBERT ANNE MARTIJN</creatorcontrib><title>Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample</title><description>The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>PHOTOGRAPHY</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjL0KwkAQhNNYiPoO-wAKwYikjihaq3VY7ja5g_tZbi-Kb-8VYmVhNfDNNzOvpksQJpVtDIDMmDBPsgZns4ljQjZWgbwkkwdO8WE1aXiWErIhsD-2gEEDgqdyoGGI6WuFsXBBz46W1WxAJ7T65KKC0_F2OG-IY0_CqChQ7u_Xtt7v6qbtts0fyhvOpkWe</recordid><startdate>20111122</startdate><enddate>20111122</enddate><creator>VAN BRUG HEDSER</creator><creator>BROUWER EGBERT ANNE MARTIJN</creator><scope>EVB</scope></search><sort><creationdate>20111122</creationdate><title>Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample</title><author>VAN BRUG HEDSER ; BROUWER EGBERT ANNE MARTIJN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8064038B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>PHOTOGRAPHY</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>VAN BRUG HEDSER</creatorcontrib><creatorcontrib>BROUWER EGBERT ANNE MARTIJN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>VAN BRUG HEDSER</au><au>BROUWER EGBERT ANNE MARTIJN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample</title><date>2011-11-22</date><risdate>2011</risdate><abstract>The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.</abstract><oa>free_for_read</oa></addata></record>
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subjects ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
title Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T22%3A30%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=VAN%20BRUG%20HEDSER&rft.date=2011-11-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8064038B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true