Subsystem of an illumination system of a microlithographic projection exposure apparatus
In general, in one aspect, the disclosure features an illumination system for a microlithographic projection exposure apparatus configured so that during operation the illumination system illuminates a reticle plane of the microlithographic projection exposure apparatus with light of a desired polar...
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| creator | FIOLKA DAMIAN |
| description | In general, in one aspect, the disclosure features an illumination system for a microlithographic projection exposure apparatus configured so that during operation the illumination system illuminates a reticle plane of the microlithographic projection exposure apparatus with light of a desired polarization distribution. The illumination system includes a first polarization-influencing optical element and a second polarization-influencing optical element. During operation the first polarization-influencing optical element converts a first polarization distribution produced by a light source unit into a second polarization distribution which is different from the first polarization distribution. The second polarization-influencing optical element converts the second polarization distribution into a third polarization distribution corresponding to the desired polarization distribution, the second polarization-influencing optical element causing an effective rotation of the preferred polarization direction through 90° over its optically effective surface. |
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| language | eng |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS |
| title | Subsystem of an illumination system of a microlithographic projection exposure apparatus |
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