Mixed polarization state monitoring
Mixed polarization state monitoring is presented. One method may include selecting a set of total dose values, and for each total dose value: exposing a location on a photoresist using illumination having an x-polarization value with an x-exposure dose ratio value of the total dose value, exposing t...
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| creator | MCINTYRE GREGORY R |
| description | Mixed polarization state monitoring is presented. One method may include selecting a set of total dose values, and for each total dose value: exposing a location on a photoresist using illumination having an x-polarization value with an x-exposure dose ratio value of the total dose value, exposing the location on the photoresist using illumination having a y-polarization value with a y-exposure dose ratio value of the total dose value, and repeating the x-polarization value exposing and the y-polarization value exposing to achieve a range of mixed polarization states and a plurality of dose ratio values that range over extremes for the x-polarization exposure and the y-polarization exposure, each repeating occurring at a different location on the photoresist; and monitoring which mixed polarization states causes a change in an image printed at the different locations in the photoresist. |
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One method may include selecting a set of total dose values, and for each total dose value: exposing a location on a photoresist using illumination having an x-polarization value with an x-exposure dose ratio value of the total dose value, exposing the location on the photoresist using illumination having a y-polarization value with a y-exposure dose ratio value of the total dose value, and repeating the x-polarization value exposing and the y-polarization value exposing to achieve a range of mixed polarization states and a plurality of dose ratio values that range over extremes for the x-polarization exposure and the y-polarization exposure, each repeating occurring at a different location on the photoresist; and monitoring which mixed polarization states causes a change in an image printed at the different locations in the photoresist.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20111004&DB=EPODOC&CC=US&NR=8031330B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20111004&DB=EPODOC&CC=US&NR=8031330B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MCINTYRE GREGORY R</creatorcontrib><title>Mixed polarization state monitoring</title><description>Mixed polarization state monitoring is presented. 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One method may include selecting a set of total dose values, and for each total dose value: exposing a location on a photoresist using illumination having an x-polarization value with an x-exposure dose ratio value of the total dose value, exposing the location on the photoresist using illumination having a y-polarization value with a y-exposure dose ratio value of the total dose value, and repeating the x-polarization value exposing and the y-polarization value exposing to achieve a range of mixed polarization states and a plurality of dose ratio values that range over extremes for the x-polarization exposure and the y-polarization exposure, each repeating occurring at a different location on the photoresist; and monitoring which mixed polarization states causes a change in an image printed at the different locations in the photoresist.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Mixed polarization state monitoring |
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