Embedded passive component network substrate fabrication method

A method of forming an embedded passive component network substrate includes providing a first carrier with a first dielectric layer and patterning the first dielectric layer to form a first patterned dielectric layer including circuit pattern artifacts. A first etch stop layer is plated within the...

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Bibliographische Detailangaben
Hauptverfasser: RUSLI SUKIANTO, HUEMOELLER RONALD PATRICK, KARIM NOZAD
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A method of forming an embedded passive component network substrate includes providing a first carrier with a first dielectric layer and patterning the first dielectric layer to form a first patterned dielectric layer including circuit pattern artifacts. A first etch stop layer is plated within the circuit pattern artifacts. A first conductor layer is plated on the first etch stop layer and within the circuit pattern artifacts. The first etch stop layer and the first conductor layer form a first etch stop metal protected circuit pattern comprising a passive component embedded with the first patterned dielectric layer.