Photo-masks and methods of fabricating surface-relief grating diffractive devices
Photo-masks for fabricating surface-relief grating diffractive devices and methods of fabricating surface-relief grating diffractive devices are described. The photo-mask can include refractive elements and/or diffractive elements contained in or on a body element. The photo-mask can be used to simu...
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| creator | MEINDL JAMES D STAY JUSTIN L GAYLORD THOMAS K MAIKISCH JONATHAN S |
| description | Photo-masks for fabricating surface-relief grating diffractive devices and methods of fabricating surface-relief grating diffractive devices are described. The photo-mask can include refractive elements and/or diffractive elements contained in or on a body element. The photo-mask can be used to simultaneously produce multiple surface-relief grating diffractive devices in a recording material. The photo-mask enables the surface-relief grating diffractive devices to be produced in large quantities while significantly reducing the cost and labor required. |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Photo-masks and methods of fabricating surface-relief grating diffractive devices |
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