Photoresist composition and method of manufacturing array substrate using the same

A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.

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Bibliographische Detailangaben
Hauptverfasser:	OH SAE-TAE, CHOI JAE-YOUNG, LEE HI-KUK, LEE MIN-SOO, YUN SANG-HYUN, KANG DEOK-MAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.