Method and arrangement for repairing photolithography masks

Method and arrangement for repairing photolithography masks

A method and apparatus for the repair of photolithography masks, wherein a photolithography mask is examined for the presence of defects and a list of the defects is generated, in which at least one type of defect, its extent, and its location on the photolithography mask is assigned to each defect,...

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Hauptverfasser: KIENZLE OLIVER, ZIBOLD AXEL, HARNISCH WOLFGANG
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
HANDLING RECORD CARRIERS
PHYSICS
PRESENTATION OF DATA
RECOGNITION OF DATA
RECORD CARRIERS
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creator KIENZLE OLIVER
ZIBOLD AXEL
HARNISCH WOLFGANG
description A method and apparatus for the repair of photolithography masks, wherein a photolithography mask is examined for the presence of defects and a list of the defects is generated, in which at least one type of defect, its extent, and its location on the photolithography mask is assigned to each defect, and these defects are repaired.
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ZIBOLD AXEL ; HARNISCH WOLFGANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US7916930B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>HANDLING RECORD CARRIERS</topic><topic>PHYSICS</topic><topic>PRESENTATION OF DATA</topic><topic>RECOGNITION OF DATA</topic><topic>RECORD CARRIERS</topic><toplevel>online_resources</toplevel><creatorcontrib>KIENZLE OLIVER</creatorcontrib><creatorcontrib>ZIBOLD AXEL</creatorcontrib><creatorcontrib>HARNISCH WOLFGANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIENZLE OLIVER</au><au>ZIBOLD AXEL</au><au>HARNISCH WOLFGANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and arrangement for repairing photolithography masks</title><date>2011-03-29</date><risdate>2011</risdate><abstract>A method and apparatus for the repair of photolithography masks, wherein a photolithography mask is examined for the presence of defects and a list of the defects is generated, in which at least one type of defect, its extent, and its location on the photolithography mask is assigned to each defect, and these defects are repaired.</abstract><oa>free_for_read</oa></addata></record>
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subjects CALCULATING
COMPUTING
COUNTING
HANDLING RECORD CARRIERS
PHYSICS
PRESENTATION OF DATA
RECOGNITION OF DATA
RECORD CARRIERS
title Method and arrangement for repairing photolithography masks
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