Reduction of etch-rate drift in HDP processes

A processing chamber is seasoned by providing a flow of season precursors to the processing chamber. A high-density plasma is formed from the season precursors by applying at least 7500 W of source power distributed with greater than 70% of the source power at a top of the processing chamber. A seas...

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Bibliographische Detailangaben

Hauptverfasser:	VELLAIKAL MANOJ, BLOKING JASON THOMAS, LEE YOUNG S, MUNGEKAR HEMANT P, WANG ANCHUAN, JEON JIN HO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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