Positive photosensitive polybenzoxazole precursor compositions

A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one plasticizer compound; (c) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduc...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RACICOT DONALD W, NAIINI AHMAD A, RUSHKIN IL'YA, WEBER WILLIAM D, POWELL DAVID B
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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