Inspection apparatus and inspection method
An inspection apparatus includes: a first light source having a first plurality of surface emitting laser elements which emit fundamental waves, respectively; a first illumination optical system configured to illuminate a first plurality of fundamental waves emitted from the first plurality of surfa...
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| description | An inspection apparatus includes: a first light source having a first plurality of surface emitting laser elements which emit fundamental waves, respectively; a first illumination optical system configured to illuminate a first plurality of fundamental waves emitted from the first plurality of surface emitting laser elements on an object to be inspected; and a stage on which the object to be inspected is placed. |
| format | Patent |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING |
| title | Inspection apparatus and inspection method |
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