Dry cleaning of silicon surface for solar cell applications

A method and apparatus for cleaning layers of solar cell substrates is disclosed. The substrate is exposed to a reactive gas that may comprise neutral radicals comprising nitrogen and fluorine, or that may comprise anhydrous HF and water, alcohol, or a mixture of water and alcohol. The reactive gas...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: RANA VIRENDRA V S, STEWART MICHAEL P
Format: Patent
Sprache:eng
Schlagworte:
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