Thermal storage type gas treating apparatus
A thermal storage type gas treating apparatus has a high sealing performance while achieving a simple apparatus construction. The thermal storage type gas treating apparatus includes a valve member rotatable to place successively a supply port for a gas to be treated and an exhaust port for a treate...
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| creator | NAGATA YUJI HORISAWA SATOSHI MATSUI YOSHIAKI MIWA TOMOTAKA |
| description | A thermal storage type gas treating apparatus has a high sealing performance while achieving a simple apparatus construction. The thermal storage type gas treating apparatus includes a valve member rotatable to place successively a supply port for a gas to be treated and an exhaust port for a treated gas formed in the valve member, in an opposed and communicating relationship with supply and exhaust ports formed in a distributor, thereby successively passing gas to be treated and treated gas through a plurality of thermal storage chambers communicating at one end with a combustion chamber. The valve member is supported to be displaceable toward and away from the distributor. A valve biasing device is provided for pressing the valve body to the distributor, while being inoperative with respect to a gas chamber device. |
| format | Patent |
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The thermal storage type gas treating apparatus includes a valve member rotatable to place successively a supply port for a gas to be treated and an exhaust port for a treated gas formed in the valve member, in an opposed and communicating relationship with supply and exhaust ports formed in a distributor, thereby successively passing gas to be treated and treated gas through a plurality of thermal storage chambers communicating at one end with a combustion chamber. The valve member is supported to be displaceable toward and away from the distributor. A valve biasing device is provided for pressing the valve body to the distributor, while being inoperative with respect to a gas chamber device.</description><language>eng</language><subject>BLASTING ; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES ; FIXED-CAPACITY GAS-HOLDERS ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; STORING OF DISTRIBUTING GASES OR LIQUIDS ; TRANSPORTING ; VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES ; WEAPONS</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100622&DB=EPODOC&CC=US&NR=7740026B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100622&DB=EPODOC&CC=US&NR=7740026B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAGATA YUJI</creatorcontrib><creatorcontrib>HORISAWA SATOSHI</creatorcontrib><creatorcontrib>MATSUI YOSHIAKI</creatorcontrib><creatorcontrib>MIWA TOMOTAKA</creatorcontrib><title>Thermal storage type gas treating apparatus</title><description>A thermal storage type gas treating apparatus has a high sealing performance while achieving a simple apparatus construction. 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The thermal storage type gas treating apparatus includes a valve member rotatable to place successively a supply port for a gas to be treated and an exhaust port for a treated gas formed in the valve member, in an opposed and communicating relationship with supply and exhaust ports formed in a distributor, thereby successively passing gas to be treated and treated gas through a plurality of thermal storage chambers communicating at one end with a combustion chamber. The valve member is supported to be displaceable toward and away from the distributor. A valve biasing device is provided for pressing the valve body to the distributor, while being inoperative with respect to a gas chamber device.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
| recordid | cdi_epo_espacenet_US7740026B2 |
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| subjects | BLASTING FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES FIXED-CAPACITY GAS-HOLDERS HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION STORING OF DISTRIBUTING GASES OR LIQUIDS TRANSPORTING VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES WEAPONS |
| title | Thermal storage type gas treating apparatus |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T09%3A18%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NAGATA%20YUJI&rft.date=2010-06-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS7740026B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |