Apparatus for wafer level arc detection at an electrostatic chuck electrode
Wafer level arc detection is provided in a plasma reactor using an RF transient sensor sensing voltage at an electrostatic chucking electrode, the RF sensor being coupled to a threshold comparator, and a system controller responsive to the threshold comparator.
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creator | PIPITONE JOHN |
description | Wafer level arc detection is provided in a plasma reactor using an RF transient sensor sensing voltage at an electrostatic chucking electrode, the RF sensor being coupled to a threshold comparator, and a system controller responsive to the threshold comparator. |
format | Patent |
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INGENERAL</subject><subject>METALLURGY</subject><subject>RELAYS</subject><subject>SELECTORS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNirEKAjEQBdNYiPoP-wPCcVekVlGEK9X6WPZe8DAkYbOnv6-F9lbDDLN0_a4UVra5UshKLw5QingiEqvQCIPYlBOxESdC_KjmamyTkNxnefzaiLVbBI4Vmy9Xjk7H6-G8RckDamFBgg23i_ed9027b7s_ljf06DU_</recordid><startdate>20100615</startdate><enddate>20100615</enddate><creator>PIPITONE JOHN</creator><scope>EVB</scope></search><sort><creationdate>20100615</creationdate><title>Apparatus for wafer level arc detection at an electrostatic chuck electrode</title><author>PIPITONE 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subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SWITCHES ELECTRICITY EMERGENCY PROTECTIVE DEVICES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY RELAYS SELECTORS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Apparatus for wafer level arc detection at an electrostatic chuck electrode |
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