Semiconductor device with semi-insulating substrate portions and method for forming the same

A method for forming semi-insulating portions in a semiconductor substrate provides depositing a hardmask film over a semiconductor substructure to a thickness sufficient to prevent charged particles from passing through the hardmask. The hardmask is patterned creating openings through which charged...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIN WENIN, LEE CHUAN-YING, TANG DENNY, CHENG HSU CHEN
Format: Patent
Sprache:eng
Schlagworte:
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