Etch before grind for semiconductor die singulation

Methods are provided, and devices made by such methods. One of the methods includes procuring a semiconductor wafer, processing the wafer to form a plurality of circuits on a top side, forming trenches on the top side between the adjacent circuits, forming a trench passivation layer on side walls of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HORCH ANDREW E, PAULSEN RONALD E, MORRELL LARRY, KOEPP RONALD L, MA YANJUN
Format: Patent
Sprache:eng
Schlagworte:
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