Real-time compensation of mechanical position error in pattern generation or imaging applications

Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in "real time") are provided. For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimen...

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Bibliographische Detailangaben
Hauptverfasser:	QIAO WENWEI, BAXTER BRUCE B, BULLER BENYAMIN, KAO HUEI-MEI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS NANOTECHNOLOGY PERFORMING OPERATIONS PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TESTING TRANSPORTING
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