Real-time compensation of mechanical position error in pattern generation or imaging applications
Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in "real time") are provided. For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimen...
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| creator | QIAO WENWEI BAXTER BRUCE B BULLER BENYAMIN KAO HUEI-MEI |
| description | Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in "real time") are provided. For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimensions may be taken allowing compensation for pitch and roll and, therefore, more accurate position measurements. Further, by including a measurement of a beam column, compensation for movement of the beam may be performed. |
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For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimensions may be taken allowing compensation for pitch and roll and, therefore, more accurate position measurements. Further, by including a measurement of a beam column, compensation for movement of the beam may be performed.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; NANOTECHNOLOGY ; PERFORMING OPERATIONS ; PHYSICS ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TESTING ; TRANSPORTING</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080708&DB=EPODOC&CC=US&NR=7397039B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080708&DB=EPODOC&CC=US&NR=7397039B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>QIAO WENWEI</creatorcontrib><creatorcontrib>BAXTER BRUCE B</creatorcontrib><creatorcontrib>BULLER BENYAMIN</creatorcontrib><creatorcontrib>KAO HUEI-MEI</creatorcontrib><title>Real-time compensation of mechanical position error in pattern generation or imaging applications</title><description>Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in "real time") are provided. 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For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimensions may be taken allowing compensation for pitch and roll and, therefore, more accurate position measurements. Further, by including a measurement of a beam column, compensation for movement of the beam may be performed.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS NANOTECHNOLOGY PERFORMING OPERATIONS PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TESTING TRANSPORTING |
| title | Real-time compensation of mechanical position error in pattern generation or imaging applications |
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