Lithographic apparatus and device manufacturing method

A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate....

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KAMIDI RAMIDLN IZAIR, DE VOS YOUSSEF KAREL MARIA, KUNST RONALD CASPER, TSO YIN TIM
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator KAMIDI RAMIDLN IZAIR
DE VOS YOUSSEF KAREL MARIA
KUNST RONALD CASPER
TSO YIN TIM
description A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US7379156B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US7379156B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US7379156B23</originalsourceid><addsrcrecordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwebG5paGpmZORsZEKAEAgzgt4g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus and device manufacturing method</title><source>esp@cenet</source><creator>KAMIDI RAMIDLN IZAIR ; DE VOS YOUSSEF KAREL MARIA ; KUNST RONALD CASPER ; TSO YIN TIM</creator><creatorcontrib>KAMIDI RAMIDLN IZAIR ; DE VOS YOUSSEF KAREL MARIA ; KUNST RONALD CASPER ; TSO YIN TIM</creatorcontrib><description>A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080527&amp;DB=EPODOC&amp;CC=US&amp;NR=7379156B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080527&amp;DB=EPODOC&amp;CC=US&amp;NR=7379156B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAMIDI RAMIDLN IZAIR</creatorcontrib><creatorcontrib>DE VOS YOUSSEF KAREL MARIA</creatorcontrib><creatorcontrib>KUNST RONALD CASPER</creatorcontrib><creatorcontrib>TSO YIN TIM</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGhwebG5paGpmZORsZEKAEAgzgt4g</recordid><startdate>20080527</startdate><enddate>20080527</enddate><creator>KAMIDI RAMIDLN IZAIR</creator><creator>DE VOS YOUSSEF KAREL MARIA</creator><creator>KUNST RONALD CASPER</creator><creator>TSO YIN TIM</creator><scope>EVB</scope></search><sort><creationdate>20080527</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>KAMIDI RAMIDLN IZAIR ; DE VOS YOUSSEF KAREL MARIA ; KUNST RONALD CASPER ; TSO YIN TIM</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US7379156B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>KAMIDI RAMIDLN IZAIR</creatorcontrib><creatorcontrib>DE VOS YOUSSEF KAREL MARIA</creatorcontrib><creatorcontrib>KUNST RONALD CASPER</creatorcontrib><creatorcontrib>TSO YIN TIM</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAMIDI RAMIDLN IZAIR</au><au>DE VOS YOUSSEF KAREL MARIA</au><au>KUNST RONALD CASPER</au><au>TSO YIN TIM</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2008-05-27</date><risdate>2008</risdate><abstract>A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US7379156B2
source esp@cenet
subjects ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Lithographic apparatus and device manufacturing method
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T04%3A52%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KAMIDI%20RAMIDLN%20IZAIR&rft.date=2008-05-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS7379156B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true