Etch process for improving yield of dielectric contacts on nickel silicides

The embodiments of the invention generally relate to an etching process, and more particularly to an etch processing for improving the yield of dielectric contacts on nickel silicides. An oxygen-free feedgas is used in an etching process to reduce or eliminate residuals, including oxidation and cons...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BANDY KENNETH A, WISE RICHARD, ALLEN SCOTT D, DESHPANDE SADANAND V
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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