Defect detection using energy spectrometer

One embodiment disclosed relates to an apparatus for detecting defects in substrates. An irradiation source is configured to generate an incident beam, and a lens system configured to focus the incident beam onto a target substrate so as to cause emission of electrons. A multiple-bin detector is con...

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Bibliographische Detailangaben
1. Verfasser: BERTSCHE KIRK J
Format: Patent
Sprache:eng
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