System and method for performing bright field and dark field optical inspection
A system and method are disclosed for performing bright field and dark field optical inspection. In one embodiment, a system is provided for performing bright field coherent detection by means of an interferometer and dark field detection of scattered light using a single apparatus. In other embodim...
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creator | HWANG SHIOW-HWEI CEGLIO NAT |
description | A system and method are disclosed for performing bright field and dark field optical inspection. In one embodiment, a system is provided for performing bright field coherent detection by means of an interferometer and dark field detection of scattered light using a single apparatus. In other embodiments, the system is operable to perform dark field detection of scattered light as well as phase measuring through phase shifting or spatial fringe analysis techniques. In yet another embodiment, an additional light source is provided for generating an illumination beam directed obliquely at the substrate to permit capture and detection of scattered light in directions near a normal direction to a surface of the substrate, and in directions away from a normal direction to a surface. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US7259869B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US7259869B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US7259869B23</originalsourceid><addsrcrecordid>eNrjZPAPriwuSc1VSMxLUchNLcnIT1FIyy9SKEgtAlK5mXnpCklFmekZJQppmak5KWBlKYlF2VBufkFJZnJijkJmXnFBanJJZn4eDwNrWmJOcSovlOZmUHBzDXH20E0tyI9PLS5ITE7NSy2JDw02NzK1tDCzdDIyJkIJAOQPNsI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>System and method for performing bright field and dark field optical inspection</title><source>esp@cenet</source><creator>HWANG SHIOW-HWEI ; CEGLIO NAT</creator><creatorcontrib>HWANG SHIOW-HWEI ; CEGLIO NAT</creatorcontrib><description>A system and method are disclosed for performing bright field and dark field optical inspection. In one embodiment, a system is provided for performing bright field coherent detection by means of an interferometer and dark field detection of scattered light using a single apparatus. In other embodiments, the system is operable to perform dark field detection of scattered light as well as phase measuring through phase shifting or spatial fringe analysis techniques. In yet another embodiment, an additional light source is provided for generating an illumination beam directed obliquely at the substrate to permit capture and detection of scattered light in directions near a normal direction to a surface of the substrate, and in directions away from a normal direction to a surface.</description><language>eng</language><subject>MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; TESTING</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070821&DB=EPODOC&CC=US&NR=7259869B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070821&DB=EPODOC&CC=US&NR=7259869B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HWANG SHIOW-HWEI</creatorcontrib><creatorcontrib>CEGLIO NAT</creatorcontrib><title>System and method for performing bright field and dark field optical inspection</title><description>A system and method are disclosed for performing bright field and dark field optical inspection. In one embodiment, a system is provided for performing bright field coherent detection by means of an interferometer and dark field detection of scattered light using a single apparatus. In other embodiments, the system is operable to perform dark field detection of scattered light as well as phase measuring through phase shifting or spatial fringe analysis techniques. In yet another embodiment, an additional light source is provided for generating an illumination beam directed obliquely at the substrate to permit capture and detection of scattered light in directions near a normal direction to a surface of the substrate, and in directions away from a normal direction to a surface.</description><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAPriwuSc1VSMxLUchNLcnIT1FIyy9SKEgtAlK5mXnpCklFmekZJQppmak5KWBlKYlF2VBufkFJZnJijkJmXnFBanJJZn4eDwNrWmJOcSovlOZmUHBzDXH20E0tyI9PLS5ITE7NSy2JDw02NzK1tDCzdDIyJkIJAOQPNsI</recordid><startdate>20070821</startdate><enddate>20070821</enddate><creator>HWANG SHIOW-HWEI</creator><creator>CEGLIO NAT</creator><scope>EVB</scope></search><sort><creationdate>20070821</creationdate><title>System and method for performing bright field and dark field optical inspection</title><author>HWANG SHIOW-HWEI ; CEGLIO NAT</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US7259869B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HWANG SHIOW-HWEI</creatorcontrib><creatorcontrib>CEGLIO NAT</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HWANG SHIOW-HWEI</au><au>CEGLIO NAT</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>System and method for performing bright field and dark field optical inspection</title><date>2007-08-21</date><risdate>2007</risdate><abstract>A system and method are disclosed for performing bright field and dark field optical inspection. In one embodiment, a system is provided for performing bright field coherent detection by means of an interferometer and dark field detection of scattered light using a single apparatus. In other embodiments, the system is operable to perform dark field detection of scattered light as well as phase measuring through phase shifting or spatial fringe analysis techniques. In yet another embodiment, an additional light source is provided for generating an illumination beam directed obliquely at the substrate to permit capture and detection of scattered light in directions near a normal direction to a surface of the substrate, and in directions away from a normal direction to a surface.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
title | System and method for performing bright field and dark field optical inspection |
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