Exceptional high reflective index photoactive compound for optical applications
A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate...
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| creator | IHAS BENJAMIN C PHAN XUAN T SETTHACHAYANON SONGVIT MICHAELS MARK DAVID |
| description | A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used. |
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The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used.</description><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHIC PROCESSES OR APPARATUS ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070612&DB=EPODOC&CC=US&NR=7229741B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070612&DB=EPODOC&CC=US&NR=7229741B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>IHAS BENJAMIN C</creatorcontrib><creatorcontrib>PHAN XUAN T</creatorcontrib><creatorcontrib>SETTHACHAYANON SONGVIT</creatorcontrib><creatorcontrib>MICHAELS MARK DAVID</creatorcontrib><title>Exceptional high reflective index photoactive compound for optical applications</title><description>A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHIC PROCESSES OR APPARATUS</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB3rUhOLSjJzM9LzFHIyEzPUChKTctJTS7JLEtVyMxLSa1QKMjIL8lPhIgk5-cW5JfmpSik5Rcp5AP1JQO1JRYU5AAZIEOKeRhY0xJzilN5oTQ3g4Kba4izh25qQX58anFBYnJqXmpJfGiwuZGRpbmJoZORMRFKAGGHN6o</recordid><startdate>20070612</startdate><enddate>20070612</enddate><creator>IHAS BENJAMIN C</creator><creator>PHAN XUAN T</creator><creator>SETTHACHAYANON SONGVIT</creator><creator>MICHAELS MARK DAVID</creator><scope>EVB</scope></search><sort><creationdate>20070612</creationdate><title>Exceptional high reflective index photoactive compound for optical applications</title><author>IHAS BENJAMIN C ; PHAN XUAN T ; SETTHACHAYANON SONGVIT ; MICHAELS MARK DAVID</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US7229741B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHIC PROCESSES OR APPARATUS</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>IHAS BENJAMIN C</creatorcontrib><creatorcontrib>PHAN XUAN T</creatorcontrib><creatorcontrib>SETTHACHAYANON SONGVIT</creatorcontrib><creatorcontrib>MICHAELS MARK DAVID</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>IHAS BENJAMIN C</au><au>PHAN XUAN T</au><au>SETTHACHAYANON SONGVIT</au><au>MICHAELS MARK DAVID</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Exceptional high reflective index photoactive compound for optical applications</title><date>2007-06-12</date><risdate>2007</risdate><abstract>A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2-8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | Exceptional high reflective index photoactive compound for optical applications |
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